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Equipment Detail

Name

Optima 7300 DV Coupled Plasma Optical Emission (ICP-OES)

Manufacturer

Perkin Elmer

Make or Model

ICP-OES

Description

The ICP-OES is another tool used for elemental analysis that couples ICP plasmas with optical emission detectors. The ICP-OES is ideal for detection elements in applications that don’t require the degree sensitivity of the ICP-MS. Typical detection limits range in the ppb to low ppm level. The instrument has dual radial and axial capabilities to allow improvement of sensitivity and selectivity for certain samples and matrices.  The ICP-OES has the advantage over ICP-MS that samples containing both mayor elements and trace elements do not represent a contamination risk for the system because only the emission light -and not the sample-enters the detector.  The wide dynamic range allows simultaneous measurements of elements present in trace, minor and major levels.

External Link

Picture

Contact Information

Contact Name

Jose Almirall

Telephone Number

305-348-3917

Fax

305-348-4485

Email

Jose.Almirall@fiu.edu
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